Magnetron Sputtering
Magnetron Sputtering, which is a form of Physical Vapor Deposition (PVD) has been a proven coating technology in many manufacturing processes for years. It produces a fine, metallic layer with good adhesion and film quality. The coating forms in a vacuum by bombardment of the target (source material of the coating) by energetic ions (Ar+). These impacts release atoms from the target that land on the substrates forming a coating. The coating process is line-of-sight, so all surfaces that "see" the target will be coated. The coating material can be selected from a large range of metals like copper, stainless steel, aluminum or gold.
- Accurate & delicate masking possible, the coating can also be removed with laser etching
- Excellent adhesion with most materials
- Low coating thickness - no changes in part dimensions
- Polished surface creates mirror finish, textured surface creates matt/low gloss/ satin finishes
- Coating conforms to the surface (the surface texture is unaltered)
- Controllable, uniform film thickness
- RF-transparent and non-conductive (NCVM) coatings are possible
- Environmentally friendly process: No Cr6, heavy metals or other hazardous materials
Virtually all non-ferromagnetic metals may be sputtered. The process temperature is close to room temperature for thin layers, so heat sensitive materials or components can be easily coated. The coating will adhere well on almost any type of substrate (metal, glass, wood, foils and plastics).